Process control (including plasma diagnostics, plasma modelling) - Part 1/3
Tuesday, September 24, 2019
Conferences, Oral
PROC
•
PROC1
•
10:30 AM
>
12:10 PM
•
Process control (including plasma diagnostics, plasma modelling) - Part 1/3
•
Ella Fitzgerald Room
PROC
10:30 AM
•
PROC1-O1-142
•
On three different ways to quantify the degree of ionization in sputtering magnetrons
>
D.
Daniel
Lundin
10:50 AM
•
PROC1-O2-115
•
Characterization of a distributed antenna array microwave plasma used for low-temperature/large-area nanocrystalline diamond film deposition
>
D.
Damia
Dekkar
11:10 AM
•
PROC1-O3-067
•
Time-resolved imaging of sputtered particles in multi-pulse HiPIMS discharge
>
J.
Jaroslav
Hnilica
11:30 AM
•
PROC1-O4-050
•
A remote plasma spectroscopy based method for monitoring of volatile chemicals in a vacuum environment
>
B.
Bimal
Kurian
11:50 AM
•
PROC1-O5-003
•
Density of N and H atoms in R/x%(N<sub>2</sub>-5%H<sub>2</sub>) (R = Ar or He) microwave afterglows
>
A.
andre
Ricard
|