Process control (including plasma diagnostics, plasma modelling) - Part 2/3
26 September 2019
Conferences, Oral
PROC
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PROC2
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10:30
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12:10
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Process control (including plasma diagnostics, plasma modelling) - Part 2/3
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Antipolis Auditorium
PROC
10:30
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PROC2-O1-071
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Synthesis of zirconium oxide thin films by reactive HiPIMS under peak current regulation
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S.
Stephanos
Konstantinidis
10:50
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PROC2-O2-066
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Understanding and influencing energies of ions incident onto substrate in bipolar HiPIMS discharges
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T.
Tomas
Kozak
11:10
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PROC2-O3-131
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Deposition process for low temperature growth of VO2 thin films on large area using the microwave plasma-assisted reactive sputtering technique
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A.
Ana
Lacoste
11:30
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PROC2-O4-169
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On the effect of stationary magnetic field on spatial distribution of deposition rate and ionized flux fraction in the HiPIMS discharge
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H.
Hamidreza
Hajihoseini
11:50
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PROC2-O5-121
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Influence of gas pulsed injection in Dielectric Barrier Discharges at atmospheric pressure.
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L.
Laura
Cacot
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