Process control (including plasma diagnostics, plasma modelling) - Part 3/3
Friday, September 27, 2019
Conferences, Keynote & oral
PROC
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PROC3
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10:30 AM
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12:00 PM
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Process control (including plasma diagnostics, plasma modelling) - Part 3/3
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Antipolis Auditorium
PROC
10:30 AM
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PROC3-K1-106
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Numerical modelling of DC magnetron discharges applied to Nb/Cu coatings in superconducting radio-frequency cavities
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T.
Thibaut
Richard
11:00 AM
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PROC3-O2-135
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Model based analysis of the Ion Flux-Energy Distribution Functions in Capacitively Coupled Multi-Frequency Plasmas
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E.
Edmund
Schüngel
11:20 AM
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PROC3-O3-133
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The magnetic asymmetry effect: theoretical investigation by using a lumped element model
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D.
Dennis
Engel
11:40 AM
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PROC3-O4-120
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Understanding the magnetron PECVD of DLC films in an acetylene admixture with a hybrid PICMC/DSMC model.
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A.
Antoine
Fauroux
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