Oxide Thin Films / Poster session #2

• TF-P2-22 • Hybrid Orientation Structure of CeO₂(100) and (110) Regions on Si(100) Substrates Formed by Orientation Selective Epitaxial Growth > T. Tomoyasu INOUE • TF-P2-23 • Formation and structure of Au and Pt epitaxial clusters supported by tungsten oxide > J. Jan POLÁŠEK • TF-P2-24 • Growth of Ce2O3 thin layers on preoxidized Cu(110) surface > M. Marie AULICKÁ • TF-P2-25 • Cerium oxide thin films supported by sputtered a-C and CNx films on silicon for the use as a catalyst in micro fuel cells > M. Martin DUBAU • TF-P2-26 • Phase transformation of amorphous TiO2 films to anatase / rutile crystalline structure > J. Jaroslav Bruncko • TF-P2-27 • NITROGEN DOPING IN SPUTTERED Ga-DOPED ZINC OXIDE THIN FILMS > V. Vladimir Tvarozek • TF-P2-28 • Analysis and properties of ZnO layers grown by PLD > A. Andrej Vincze • TF-P2-29 • Impedance Measurements in Delta Bismuth Oxide Thin Films > C. Celia Lizeth Gomez • TF-P2-30 • Optical and structural properties of ITO and ITON thin films > M. Marina Sparvoli • TF-P2-31 • Optical Characterization of Sol-Gel ZnO:Al Thin Films > T. Tatyana Ivanova • TF-P2-32 • Reactive sputter deposited nanocoral ZnO for biosensors > M. Michał A. Borysiewicz • TF-P2-33 • Fabrication and characterization of organic thin-film transistor using antimony-doped tin oxide electrodes > J. Jaehyung Lee • TF-P2-34 • Characterization and preparation of PbOx thin film by reactive magnetron sputtering > A. Asmae HAMZAOUI • TF-P2-35 • Grain Crystallization Control and Large Magnetoresistance Emergence in Fe3O4/a-SiO2 Thin Films Produced by Rapid Thermal Deoxidation Method > H. Hiromi Kobori • TF-P2-36 • Porous Anodic Alumina as Antireflection Coatings of Thin Film Solar Cells > S. Shuying Cheng • TF-P2-37 • Elaboration of nanocomposite thin films by in-situ reduction during non-reactive sputtering of a ceramic target > L. Lionel PRESMANES • TF-P2-38 • Near-surface 2D-nanostructures in TiO2-δ and ZnO1–δ meso-structures > A. Andrey LISACHENKO • TF-P2-39 • The properties of TiO2 thin films deposited on silicon by Atomic Layer Deposition > A. Andrey LISACHENKO • TF-P2-40 • ZnO-Ag composite by reactive magnetron co-sputtering: structural and morphological characterisations > R. Rémy FRANCQ • TF-P2-41 • Structural and optical proprieties of ZnO thin films deposited by Spray Plasma device > K. Kamal Baba • TF-P2-41A • Electrochromic materials deposited by the magnetron sputtering technique > S. Sébastien Dubourg • TF-P2-42 • Katia Ayouz / No Show • TF-P2-43 • Yamina Beggah • TF-P2-44 • Growth behavior of cyclic chemical vapor deposited Al2O3 layer for passivation of OLEDs lighting devices > H. ha jun jang • TF-P2-45 • PROPERTIES OF FTO FILMS WITH DIFFERENTS CONCENTRATIONS > J. José Alberto LUNA LÓPEZ