Reactive Sputter Deposition / Reactive Processes (joint with RSD 2013 and ITFPC 2013) / Poster session #3


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Reactive Sputter Deposition / Reactive Processes (joint with RSD 2013 and ITFPC 2013) / Poster session #3 Thursday, September 12, 2013 Joint TF/SE • TF/SE-P3 • 2:00 PM > 4:00 PM • Reactive Sputter Deposition / Reactive Processes (joint with RSD 2013 and ITFPC 2013) / Poster session #3 • Poster Area 2 (Neuilly Aisle) Joint TF/SE • TF/SE-P3-01 • Formation of hydrated oxide thin films by reactive sputtering in H2O atmosphere and their electrical properties > Y. Yoshio ABE • TF/SE-P3-02 • Antireflective SiOxNy layers deposition by reactive gas pulsing process for Si-based thin photovoltaïc films > A. Amira FARHAOUI • TF/SE-P3-03 • Crystallization control of hydrogenated amorphous silicon layers grown on Si(100) and Ge(100) through a glow-discharge of SiH4 > L-S. Lu-Sheng Hong • TF/SE-P3-04 • Physical Properties of Reactive RF Magnetron Sputtered Silicon Dioxide Thin Films > I. Ioshiaki Doi