The conference > Scientific program

09:25 • PL1 • Plasma-surface interactions of atomic-layer processing toward sub-nm node semiconductor devices > S. Satoshi HAMAGUCHI (Osaka)

10:35 • SURF1-O1-019 • Gas- and plasma-surface interactions in cryogenic conditions: a quasi in situ XPS study on Si substrates > C. Christophe CARDINAUD (NANTES) 10:55 • SURF1-O2-034 • Selective cryoetching plasma process of Si3N4 > R. Rémi DUSSART (Orléans) 11:15 • SURF1-O3-049 • Photoresist removal in MEMS fabrication process with HDRF®, optimized chemistry by adding hydrogen radical in oxygen process > M. Marc SEGERS (Bernin) 11:35 • SURF1-O4-108 • Effects of the substitution of Ar by Kr in ALE process of GaN > C. Cédric MANNEQUIN (Nantes) 11:55 • SURF1-O5-081 • Impact of temperature towards the reduction of C4F8 passivating gas-flow during bosch processing > J. Jack NOS (Orléans)

10:35 • DEPO1-O1-015 • Properties of a new TiTaZrHfW(-N) refractory high entropy film deposited by reactive DC pulsed magnetron sputtering > A. Abdelhakim BOUISSIL (Chaumont) 10:55 • DEPO1-O2-045 • Chemical and physical properties of gold-boron Laser Mégajoule target components coated by sputtering Physical Vapor Deposition > E. Etienne BRUN (IS-SUR-TILLE) 11:15 • DEPO1-O3-150 • PVD coating on metallic powders: an innovative metallurgical process > A. Aurélien BESNARD (Cluny) 11:35 • DEPO1-O4-051 • Group III-nitride semiconductor materials made by low temperature plasma based Atomic Layer Deposition > N. Noureddine ADJEROUD (Esch sur Alzette) 11:55 • DEPO1-O5-115 • Engineering multifunctional thin films by plasma copolymerization > A. Asma RIAHI (Mulhouse)

14:00 • PL2 • Electrical characterization of barrier discharges: linking fundamentals and applications > R. Ronny BRANDENBURG (Greifswald)

14:45 • SOUR1-O1-048 • Self-organization of HiPIMS plasma investigated by high-speed camera > M. Matjaz PANJAN (Ljubljana) 15:05 • SOUR1-O2-084 • Angular distribution of ions and neutrals in High Power Impulse Magnetron Sputtering of titanium > J. Joel FISCHER (Linköping)

14:45 • DEPO2-O1-058 • Plasma polymer-metal composites: relations between chemical structure, topography and electrical properties > P. Paul LOTTIN (Le Mans) 15:05 • DEPO2-O2-074 • Double tube configuration of atmospheric pressure plasma jet for deposition of organic coatings in open air > F. Farzaneh AREFI-KHONSARI (PARIS) 15:25 • DEPO2-O3-161 • Environmentally-friendly plasma polymers to get durable water-repellent textile fabrics: a comprehensive study on coating structure-performance relationship > F. Florence BALLY-LE GALL (Mulhouse)

15:25 • PROC1-O1-163 • A comparison between simulation & experimental results of a low-pressure Argon plasma generated by ECR > Y. Youcef FERMI (DECINES CHARPIEU)

16:15 • PROC2-K1-088 • Studying the transport of atoms sputtered from a compound NBC target in HiPIMS discharges: plasma diagnostics and modelling > T. Tomas KOZAK (Plzen) 16:45 • PROC2-O1-082 • Sputtered atom density – target heating correlation in hot magnetron sputtering discharge > K. Kseniia LEONOVA (Mons) 17:05 • PROC2-O2-169 • Characterization of a helium micro-plasma jet by means of ps-TALIF and a streak camera > K. Kristaq GAZELI (Villetaneuse)

16:15 • NANO1-K1-121 • Investigation by TEM and XPS of the thermal stability of multi-layer solar selective absorber > M. Mireille RICHARD-PLOUET (Nantes) 16:45 • NANO1-O1-140 • Pulsed laser processes for the development of gold/silver nanocomposites for plasmonic applications > M. Manon GIREAU (Limoges) 17:05 • NANO1-O2-102 • Influence of Cu nanoparticles addition on fracture properties of sputter deposited nanostructured refractory MoNbTaVW HEA coatings > M. Michal ZITEK (Leoben)

17:30 • ITEC1-O1-006 • A plasma for multidimensional elemental and molecular analysis of surfaces & interfaces > P. Patrick CHAPON (Palaiseau) 17:45 • ITEC1-O2-009 • Advanced patterning – ion beam etching for nano structuring > M. Manuela LOETSCH (Chemnitz) 18:00 • ITEC1-O3-172 • Advanced retarding field energy analyzer for accurate measurement of ion energy and flux in plasma-assisted thin film deposition tools > T. Thomas GILMORE (Dublin) 18:15 • ITEC1-O4-151 • How to identify the optimal plasma treatment length for different surfaces > V. Véronique Schloupt (METZ)

• DEPO-P1-018 • Effect of interfacial SiNX ultra-thin film on optical and electrical properties of PVD antireflective coating > B. Beji HIBA (Clermont-Ferrand) • DEPO-P1-026 • Effect of Tantalum addition on properties of Cu–Zr–based Thin Film Metallic Glasses (TFMGs) > S. Soufyane ACHACHE (Nogent) • DEPO-P1-039 • Development and characterization of chromium-based PVD coatings for the protection of stainless steel bipolar plates for PEM fuel cells > J. JORDI ORRIT-PRAT (MANRESA) • DEPO-P1-067 • Tailoring surface properties of Zr-V thin films by competitive self-separation of crystalline and amorphous phases during sputtering > R. Raya EL BEAINOU (Nancy) • DEPO-P1-182 • Synthesis of Multifunctional Flexible Zn-Al Based Oxide Thin Film with Antibacterial and Moisture Barrier Properties using Atomic Layer Deposition System > J. JiHo EOM (DaeJeon) • DEPO-P1-193 • Impact of plasma assistance on SiO2 and HfO2 thin films physicochemical and photometric aging properties > A. Arthur SOUTENAIN (Le Barp) • DEPO-P1-197 • Sputtering Techniques for Smart Textiles > D. Dirk HEGEMANN (St. Gallen) • DEPO-P1-207 • Using evaporation to create hydrophobic coating • GROM-P1-063 • Depth Resolved XRD Measurements using in-situ XRD during Ion Beam Sputtering > S. Stephan MÄNDL (Leipzig) • GROM-P1-123 • "MISSTIC": a multi-tool experimental setup for magnetron sputtering deposition combined with in situ and real-time characterization > H. hervé MONTIGAUD (Aubervilliers) • GROM-P1-126 • Augmented reality representation for the investigation of simulated inclined chromium thin films > N. Noé WATIEZ (Cluny) • GROM-P1-149 • Chromium carbide coatings by DC sputtering of a sintered target. > A. Aurélien BESNARD (Cluny) • GROM-P1-199 • Ion beam sputter deposition of epitaxial Ga2O3 thin films on c-plane Al2O3 > D. Dmitry KALANOV (Leipzig) • HELIAG-P1-044 • Polysaccharide coatings for urinary catheters > A. Alenka VESEL (Ljubljana) • HELIAG-P1-099 • Plasma Polymer Coatings of Non-planar Materials for Bioapplications > L. Lucie JANŮ (Brno) • HELIAG-P1-101 • Towards a development of integrated micro-electro-apta-sensors into a diabetes organoid-on-a-chip device. > A. Axelle AUBERT (GREnoble) • HELIAG-P1-177 • Influence of varying plasma parameters on the response of MG-63 osteoblast-like cells onto poly(allylamine) thin films > H. Hernando III SALAPARE (Mulhouse) • HELIAG-P1-203 • Investigation of toxicity of Plasma Activated Water on Lemna Minor > N. Nevena PUAC (Belgrade) • ITEC-P1-107 • Industrial Technology for ta-C Coatings Deposition > J. Jan KLUSON (Sumperk) • ITEC-P1-110 • Innovative conformal deposition solution into TSV integration for oxide, nitride, and metal layers by pulsed liquid precursor injection > P-D. Pierre-David SZKUTNIK (Bernin) • NANO-P1-017 • Localized laser texturing of passivating nano-layer deposited by PVD for industrial olfactory sensors applications > W. William RAVISY (Andrézieux-Bouthéon) • NANO-P1-096 • Zirconium-based nanocatalysts by sputtering onto glycerol and solid carbon > S. Soumya ATMANE (orleans) • NANO-P1-132 • Direct Liquid Reactor-Injector of Nanoparticles: a safer-by-design aerosol injection for nanocomposite thin-film deposition adapted to various plasma-assisted processes  > R. Richard CLERGEREAUX (Toulouse) • NANO-P1-144 • Optical and structural analysis of silicon nitride co-doped with erbium and ytterbium > A. Afaf BRIK () • NANO-P1-194 • Structural and chemical characterizations of nanostructured cermet aluminium oxy-nitride / copper films > M. Mireille RICHARD-PLOUET (Nantes) • NANO-P1-202 • Synthesis of ultra-thin film MAA:PEGDMA hydrogels with customized properties by atmospheric pressure plasma > J. Jordi SANS (Esch/Alzette) • PROC-P1-098 • Optical diagnostics of a N2/Ar microplasma for the deposition of hexagonal Boron Nitride. > B. Belkacem MENACER (Villetaneuse) • PROC-P1-129 • Tuning plasma-droplet interactions in dielectric barrier discharge at atmospheric pressure for thin-film deposition  > L. Luc STAFFORD (Montréal (Québec)) • PROC-P1-131 • Time-Resolved Optical Emission Spectroscopy Analysis of a low-pressure RF Plasma with Pulsed Injection of Argon, Pentane, and ZnO Nanoparticles > M. Marguerite DION (Montréal) • PROC-P1-137 • Developing a method with optical emission spectroscopy to control thin layer in R-HiPIMS deposition process > D. Dimitri BOIVIN (Orléans) • PROC-P1-142 • Study of N2/H2 plasmas produced by an active screen source: contamination due to NO production and role of hydrogen in the gas mixture. > R. Robert HUGON (Nancy) • PROC-P1-174 • Impact of electronegativity and monoenergetic electrons on the properties of electrostatic sheaths in magnetized discharge plasmas. > S. Samir CHEKOUR (ALGER) • PROC-P1-185 • Pulsed aerosol assisted plasma deposition: influence of the injection parameters > R. Richard CLERGEREAUX (Toulouse) • PROC-P1-189 • In-Situ Temperature Measurement of Components in PECVD Machines with a 3-Fold Rotation > P. Paul JÄCKH (Stuttgart) • PROC-P1-195 • Equivalent electrical circuit modeling of a He dielectric barrier discharge plasma jet > M. Marija PUAČ (Belgrade) • SOUR-P1-143 • Dynamics of the material ejection in a dipolar arc in DC regime and its connection to the arc noise > R. Robert HUGON (Nancy) • SOUR-P1-152 • O2 shielding modulates the spatiotemporal density of Ar(1s5) in argon atmospheric-pressure micro-plasma jets > J. Joao SANTOS SOUSA (Orsay) • SOUR-P1-158 • New micro-plasma reactors for the synthesis of heterostructures of 2D films of hexagonal Boron Nitride and Graphene > A-A. Abd-Almalik HALFAOUI (Orsay)

08:40 • PL3 • Nonthermal plasma synthesis of photonic silicon nanocrystals > U. Uwe KORTSHAGEN (Minneapolis)

09:25 • NANO2-O1-100 • ZnO nanoparticles thin films and evolution of their photoluminescence under oxygen plasma treatment > J. Julien CHEVET (Nantes) 09:45 • NANO2-O2-075 • Optical study of metallic nanoparticles generated by thin-layer ion irradiation > V. Valentin GOFFINET (Charleroi)

09:25 • DEPO3-O1-040 • VN coatings for supercapacitor, an innovative approach to improve stability > E. Emile HAYE (NAMUR) 09:45 • DEPO3-O2-065 • Plasma-assisted segregation of self-grown catalytic nanoparticles in perovskites for H2 production by photoelectrocatalysis > T. Thomas GRIES (Nancy)

10:35 • NANO3-O1-073 • Plasmonic Cu nanoparticles embedded in semiconductor heterostructures for photoconversion applications > Y. Yerila RODRIGUEZ-MARTINEZ (Nancy) 10:55 • NANO3-O2-092 • Development of a microwave microplasma process for the elaboration of nanodiamonds > A. Abdoulaye SIBY (Villetaneuse) 11:15 • NANO3-O3-076 • Dielectric barrier discharge in nitrogen for the realization of nanocomposite layers using multifrequency excitation and gold salt precursors > E. Elene BIZERAY (Toulouse Cedex 09) 11:35 • NANO3-O4-120 • Synthesis of gold/polymer nanocomposites in an atmospheric pressure plasma > A. Alexandre PERDRAU (PERPIGNAN) 11:55 • NANO3-O5-146 • Au nanoparticles decoration of different TiO2 nanostructures using atmospheric pressure cold plasma > A. Andjelika Bjelajac (Esch-sur-Alzette)

10:35 • DEPO4-O1-079 • W/W-SiCH/TaOXNY solar selective absorber coatings for concentrated solar power > A. Amine Mahammou (Perpignan) 10:55 • DEPO4-O2-148 • PVD coatings for PEMFC bipolar plates functionalization > M-A. Marie-Alix LEROY (Andrézieux-Bouthéon) 11:15 • DEPO4-O3-128 • Characterization of CuBi2O4 thin films deposited by RF magnetron sputtering > L. Lionel PRESMANES (Toulouse) 11:35 • DEPO4-O4-166 • High-rate reactive deposition of ultrawide bandgap Ga2O3 by liquid metal target sputtering > J. Juris PURANS (Riga) 11:55 • DEPO4-O5-124 • Non-equilibrium synthesis of Si1-XMnX thin films for magnetic application > A. Adrian BENEDIT-CÁRDENAS (Nancy)

14:00 • PL4 • Plasma-assisted CO2 recycling: investigation on volume and surface kinetic > T. Tiago SILVA (Lisbon)

14:45 • PLACC1-O1-133 • Interplay of transport, plasma concentration and chemistry in microwave discharges > G. Gerard VAN ROOIJ (Maastricht) 15:05 • PLACC1-O2-119 • Plasma-assisted CO2 hydrogenation over Ir/TiO2 catalytic thin films in a DBD reactor > J. Joseph Gregory (Coventry) 15:25 • PLACC1-O3-173 • Discharges in honeycomb monoliths and capillary tubes > K. Karol HENSEL (Bratislava) 15:45 • PLACC1-O4-027 • Synthesis and effect of BiVO4 thin films heterojunctions deposited by reactive magnetron co-sputtering on photogenerated charges for visible light photocatalysis > M. Mathias GOUTTE (Clermont-Ferrand)

14:45 • HELIAG1-O1-037 • Bactericidal surface treatments for dental implants based on silver and copper MEVVA ion co-implantation > R. Raul BONET (MANRESA) 15:05 • HELIAG1-O2-093 • Combination of plasma-polymer thin films and topography to limit bacterial adhesion > A. Amelia WHITELEY (Grenoble) 15:25 • HELIAG1-O3-122 • Investigation of the antibacterial properties of silver-doped amorphous carbon coatings produced by low pressure magnetron assisted acetylene discharges > V. Valentin JOB (Namur) 15:45 • HELIAG1-O4-153 • The role of short- and long-lived reactive species on the anti-cancer action of plasma-treated liquids: in vitro and in vivo applications > J. Joao SANTOS SOUSA (Orsay)

• ITEC2-O1-030 • DLC coatings with tailorable functionalities as a function of SP3/SP2 hybridization > B. Biplab PAUL (Selzach) • ITEC2-O2-168 • Optical emission spectroscopy of carbon plasma discharged by constant pulse current High Power Impulse Magnetron Sputtering > A. Anna W. ONISZCZUK (Zielonka) • ITEC2-O3-078 • Optimized cylindrical inertial electrostatic confinement plasma source for thin film applications > D. Dominik TIEDEMANN (Stuttgart) • ITEC2-O4-125 • Deposition of SiOX based functional thin films for adhesion promotion and corrosion resistance using atmospheric pressure plasma jet > D. Dhia BENSALEM (Steinhagen) • ITEC2-O5-171 • Remote optical gas sensing to improve plasma and thin film quality & repeatability > N. Nessima KAABECHE (Liverpool)

• DEPO-P2-021 • Plasma magnetron sputtering using combinatorial approach to deposit complex alloys thin films > D. Dimitri BOIVIN (Orléans) • DEPO-P2-032 • Solar-blind photodetectors based on β-Ga2O3 fabricated by oxygen plasma assisted-pulsed laser deposition   > E. EUN KYU KIM (Seoul) • DEPO-P2-090 • Plasma decontamination of surfaces using a microwave torch – assessment of the additional role of a TiO2 photocatalytic layer > C. Christelle DUBLANCHE-TIXIER (LIMOGES) • DEPO-P2-094 • Elaboration and characterization of WO3/TiO2 nanostructured photoanodes for solar water splitting > T. Timothee LANG (Paris) • DEPO-P2-130 • Superelastic TiZrNb and TiZrNbSn coatings for biomedical applications > G. Gregory ABADIAS (Poitiers) • DEPO-P2-183 • Fabrication of High-Quality Moisture Barrier Film using SiNx/SiOF/SiNx via Pilot-Scale Roll-to-Roll PECVD System > T. TAE YEON CHO (Daejeon) • DEPO-P2-198 • Thin-Film Hydrogels Deposited by Atmospheric-Pressure Nano-second Plasma-Induced Polymerization of MAA:EGDMA > I. Ingrid AZEVEDO GONCALVES (Esch-sur-Alzette) • DEPO-P2-208 • Synthesis and characterization of chromium doped VO2 thin films for new applications > C. Corinne CHAMPEAUX (LIMOGES) • GROM-P2-007 • The influence of structural design on the properties of TiN coatings > D. Daniel MUNTEANU (Brasov) • GROM-P2-070 • Modelling of thin film deposition into nanofibrous mats > D. David NEČAS (Brno) • GROM-P2-127 • Analyse of the angular distribution of the columns of chromium tilted thin films through a comprehensive simulation > N. Noé WATIEZ (Cluny) • GROM-P2-134 • Biased reactive high power impulse sputtering of silica > G. György SÁFRÁN (Budapest) • LIQU-P2-178 • Influence of σ and ε on the streamer dynamics at water surface > A. Ahmad HAMDAN (Montreal) • LIQU-P2-192 • Plasma assisted modification of colloidal Zn nanoparticles > K. Kinga KUTASI (Budapest) • LIQU-P2-200 • Can process parameters significantly influence the size of Silver nanoparticles synthesized by sputtering onto liquids? > H. Heloise LASFARGUES (Aachen) • NANO-P2-029 • Creation of pure and homogeneous carbon nanoparticles from laser-induced carbon vapors > A. Agata KACZMAREK (Warszawa) • NANO-P2-054 • GLAD sputtering of nanostructured Ta thin films: Influence of deposition angle on electrical resistivity at cryogenic temperature > H. Hamidreza GERAMI (Besançon) • NANO-P2-072 • Galvanic corrosion-based antibacterial bimetallic nanoparticles produced by cylindrical gas aggregation source > N. Natalia KHOMIAKOVA (Prague) • NANO-P2-118 • Laser beam nanostructuring of gadolinium-doped cerium oxide (GDC) oxide thin films deposited by plasma magnetron sputtering > A-L. Anne-Lise THOMANN (Orléans) • NANO-P2-190 • Plasma Assisted Nitriding of 2D transition metal carbide (MXene) thin films > L. Luc PICHON (POITIERS Cedex 9) • NANO-P2-204 • Yttria‐stabilized Zirconia thin films prepared by Radio Frequency magnetron sputtering for Oxygen Sensors > A. Amira BENAYACHE (Marseille) • PLACC-P2-014 • Synthesis of Nanoparticles by reactive magnetron sputtering on Ionic Liquid for photocatalytic applications, from metallic to Bi-based compound nanoparticles. > A. Angélique BOUSQUET (Aubière) • PLACC-P2-047 • Dissociation of ammonia by microwave discharges in medium pressure range: an experimental study. > M. Majed AWAJI (Nancy) • PLACC-P2-186 • Discharge initiated synthesis of molecular life precursors in carbon monoxide based atmospheres > F. Frantisek KRCMA (Brno) • PLACC-P2-205 • Impact of water on atmospheric plasma ethanol conversion for hydrogen production using nano-pulsed plasma reactor > D. Dane LOJEN (Bruxelles) • SURF-P2-059 • In-situ FTIR spectroscopic analysis of plasma activation and plasma polymer film deposition on polylactid acid > H. Hendrik MÜLLER (Paderborn) • SURF-P2-136 • How to functionalize PVD ZrCu-based thin film metallic glasses? Effect of an ultrashort laser surface treatment > P. Philippe STEYER (Villeurbanne) • SURF-P2-138 • Functionalization of MIL-53(Al) by means of ECR plasma treatment: a feasibility study > G. Grégory MARCOS (Nancy) • SURF-P2-155 • Increasing the hydrogen storage capacities of MIL-53 Al by amino-grafting functionalization using an impulse dielectric barrier discharge plasma > A. Aymane NAJAH (Bourges) • SURF-P2-157 • Plasma surface modification of glass and stainless steel by an atmospheric-pressure air DBD treatment > A. Aymane NAJAH (Bourges) • SURF-P2-159 • Study by optical emission spectroscopy (OES) of the characteristics of the plasma jet produced by an Axial Injection torch (TIA): influence of a substrate placed on the jet axis > C. Christophe CHAZELAS (LIMOGES) • SURF-P2-181 • Towards Accurate Sputtering Simulations: Developing Machine Learning-Based Interatomic Potentials for Silicon > Y. Yudai KOTANI (Osaka) • SURF-P2-184 • Surface wettability modification of polyimide films by pulsed magnetron sputtering > M. Maria BARRERA (Dresden) • SURF-P2-187 • Advancing NH3 Sensing with Plasma Reduction of Graphene Oxide > A. Ardita KURTISHAJ (Ljubljana) • SURF-P2-188 • Hydrogen plasma reduction of regolith simulant > J. Joris KADOK (ESCH-SUR-ALZETTE) • TRIB-P2-013 • Mechanical properties and tribological performances of AlTiZrTaHf(-N) high entropy nitrides deposited by reactive magnetron sputtering > M. Mohamed EL GARAH (Nogent) • TRIB-P2-038 • Development and characterization of ultra-hard DLC coatings for high quality machining of high strength aluminium alloys > J. Jaume CARO (MANRESA) • TRIB-P2-056 • Properties of tungsten-tantalum diboride coatings deposited by High power impulse magnetron sputtering (HiPIMS) > R. Rafał PSIUK (Warsaw) • TRIB-P2-066 • Comparison of high-temperature tribological properties in different high-entropy sublattice ceramic coatings > A. Andreas KRETSCHMER (Vienna) • TRIB-P2-083 • Effect of annealing temperature on morphological and microstructural properties of CrN-MoN multilayers deposited by reactive magnetron sputtering > R. Rubenson MAREUS (Orléans) • TRIB-P2-114 • Zirconium-based thin film metallic glasses prepared by magnetron sputtering > P. Pavel SOUCEK (Brno) • TRIB-P2-156 • Increasing the thickness of sputtered Cr films by HiPIMS-DOMS  > S. Sunday Adeniyi ADEBAYO (Coimbra) • TRIB-P2-176 • Influence of temperature on the properties of W-Ti-B coatings deposited with the HiPIMS method > T. Tomasz MOSCICKI (Warsaw) • TRIB-P2-201 • Plasma Electrolytic Oxidation of additively manufactured AlSi10Mg alloy  > P. Paula BRONISZEWSKA-WOJDAT (Warsaw)

08:40 • PL5 • Low temperature plasmas for conductive carbons and multimaterials > E. Eva KOVACEVIC (Orléans)

09:25 • PROC3-O1-061 • Investigation of ionized metal flux fraction at industrial conditions > P. Petr VAŠINA (Brno) 09:45 • PROC3-O2-071 • Study of the ion energy distribution in the ALE process of GaN > T. Thomas TILLOCHER (Orléans)

09:25 • GROM1-O2-160 • Molecular dynamics approach for the calculation of surface loss probabilities during the growth of C:H films from an argon-methane plasma > G. Glenn Christopher OTAKANDZA KANDJANI (Orléans) 09:45 • GROM1-O1-116 • Multi-level investigation of the formation of silicide interface during Cu/Si energetic deposition process; a combined ab-initio, molecular dynamic, in-situ stress measurement and kinetic monte carlo simulation study > C. Cédric MASTAIL (FUTUROSCOPE CHASSENEUIL)

10:35 • PROC4-O1-033 • Plasma chemical reactions governed by the specific energy input > D. Dirk HEGEMANN (St. Gallen) 10:55 • PROC4-O2-095 • Analysis of low-pressure misty plasma processes by Optical Emission Spectroscopy > A. Agnes GRANIER (NANTES) 11:15 • PROC4-O3-105 • How carbon nanoparticles affect the behaviour of the plasma electrolytic oxidation process > L. Lucas MAGNIEZ (Nancy) 11:35 • PROC4-O4-087 • Nanocrystalline diamond coatings of titanium and titanium alloys for biomedical applications using distributed antenna array microwave system > A. Azadeh VALINATAJ OMRAN 11:55 • PROC4-O5-055 • Reduction of oxide using an electron cyclotron wave resonance Ar/H2 plasma - towards lunar raw materials use for H2O production > M. Marko SIKIRIC (Esch-sur-Alzette)

10:35 • GROM2-O1-112 • Nanostructured plasma polymers from citronellal: the role of substrate’s chemistry > J. Jamerson OLIVEIRA (Mulhouse) 10:55 • GROM2-O2-046 • Polymerization mechanisms in complex geometries using HMDSO low-pressure plasmas > P. Paula NAVASCUES (St. Gallen) 11:15 • GROM2-O3-147 • Boron-carbon thin films deposited via Plasma-Enhanced Atomic Layer Deposition (PE-ALD) > N. Neil Richard INNIS (Villeurbanne) 11:35 • GROM2-O4-035 • Study of III-V thin films growth directly on silicon by remote-plasma CVD: towards a reduction in solar cell industrialisation costs > L. Lise WATRIN (Palaiseau) 11:55 • GROM2-O5-053 • Sputtering and annealing of Mg2SiO4 films as proxy of pristine component of the solar system > V. Vincent GUIGOZ (Valbonne)

14:00 • PL6 • How reactive species from cold plasma are transported into liquid water bulk/aerosol > Z. Zdenko MACHALA (Bratislava) 14:45 • LIQUI1-O1-077 • Gas phase properties and plasma-liquid interactions during DC and pulsed sputtering onto glycerol > S. Soumya ATMANE (orleans) 15:05 • LIQUI1-O2-016 • Atmospheric pressure plasma jet in contact with a liquid for the formation of silver and gold nanoparticles and their applicatio > T. Tatiana HABIB (Albi) 15:25 • LIQUI1-O3-011 • Growth mechanism of nanosheets by discharges in liquids > T. Thierry BELMONTE (NANCY)

14:45 • TRIB1-O1-060 • Synthesis and characterization of the ceramic refractory metal high entropy carbide thin films from the Cr-Hf-Mo-Ta-W system > S. Stanislava DEBNAROVA (Brno) 15:05 • TRIB1-O2-206 • High-power-density sputtering of industrial-scale targets: case study of (Al,Cr)N > F. Fedor KLIMASHIN (Thun) 15:25 • TRIB1-O3-020 • Oxidation resistance and mechanical properties of AlTiZrHfTa(-N) high entropy films deposited by reactive magnetron sputtering > D. Djallel Eddine TOUAIBIA (Nogent)

16:15 • GROM3-K1-025 • Growth mechanism of metallic foams synthetized by plasma electrolysis deposition: a numerical study > B. Benjamin DUFOUR (Nancy) 16:45 • GROM3-O1-041 • In situ study of the amorphous-to-crystalline phase transformation of thermochromic SmNiO3-δ thin films > Z. Zil FERNANDEZ-GUTIERREZ (Nancy) 17:05 • GROM3-O2-031 • Growth manipulation strategies of ultrathin metallic layers aided by in situ and real-time diagnostics > G. Gregory ABADIAS (Poitiers) 17:25 • GROM3-O3-117 • Study on the effects of N2 addition during Ag thin film sputtering deposition, using in situ and real-time measurements > R. Ramiro ZAPATA (Aubervilliers) 17:45 • GROM3-O4-062 • Initial phase formation during nitriding of austenitic stainless steel > D. Darina MANOVA (Leipzig)

16:15 • TRIB2-K1-162 • A small-scale approach to characterize Ti-based thin films tribological behavior in operando conditions > P. Philippe STEYER (Villeurbanne) 16:45 • TRIB2-O1-141 • Neon enhanced plasma ionization in Cr films deposition by HiPIMS-DOMS > J. Joao OLIVEIRA (Coimbra) 17:05 • TRIB2-O2-043 • Tribological characterization of TiO2 thin films prepared by magnetron sputtering: the link between color change and TiO2 wear > S. Sarah MARION (Saint-Etienne) 17:25 • TRIB2-O3-111 • Revisiting the mechanical properties of TiB2±Z thin films grown from DCMS and HiPIMS > L. Ludwig ENZLBERGER (Vienna) 17:45 • TRIB2-O4-113 • Role of Ti-Al-based thin films modified wettability on heat transfer exchange during droplet impact onto a heated surface > A. Alexis Carlos GARCÍA WONG (Nancy)

08:40 • PL 7 • Surface engineering for sustainable future: multifunctional coatings for optics, energy, aerospace and manufacturing applications > L. Ludvik MARTINU (Montreal)

09:25 • DEPO5-O1-167 • VO2 thin films for thermal devices, the beginnings of a radiative thermal transistor > I. Irving ALONZO-ZAPATA (Limoges) 09:45 • DEPO5-O2-135 • Pulsed magnetron sputtering of strongly thermochromic VO2-based coatings with a low transition temperature > S. Sadoon FARRUKH (Plzen)

09:25 • SURF2-O1-042 • Plasma-surface interactions in oxygen-containing plasmas > V. Vasco GUERRA (Lisboa) 09:45 • SURF2-O2-109 • Plasma electrolytic oxidation of aluminium with incorporation of carbon black nanoparticles > G. Gérard HENRION (Nancy)

10:35 • DEPO6-K1-080 • Photochromic properties of rare-earth oxyhydride thin films for smart windows applications > D. Dmitrii MOLDAREV (Uppsala) 11:05 • DEPO6-O1-010 • Growth mechanisms and properties of magnetron sputtered TiO2 thin films on complex 3D FOAM substrates > L. Loris CHAVÉE (Namur) 11:25 • DEPO6-O2-022 • Plasma diagnostics of a pulsed hollow cathode discharge and deposition of copper nickel oxide thin films > R. Rainer HIPPLER (Prague 8) 11:45 • DEPO6-O3-036 • Reactive D.C. magnetron sputter deposition of crystalline silver niobate thin films > L. Lukas KÖLBL (Leoben)

10:35 • SURF3-K1-068 • Electrochemical characterization of surface damage in n-type GaN induced by Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) and Atomic Layer Etching (ALE) > C. Carole PERNEL (Grenoble) 11:05 • SURF3-O1-050 • Deep etching of bulk titanium in fluorinated plasmas for biomedical devices > R. Rim ETTOURI (Orléans) 11:25 • SURF3-O3-145 • Properties of nitrided layers produced in an active-screen plasma nitriding process > G. Grégory MARCOS (Nancy) 11:45 • SURF3-O4-104 • Dual-phase nanocomposite coatings based on crystalline ZrN and glassy ZrCu > P. Petr ZEMAN (Plzen)