 Invited lectures for CIP MIATEC 2017
The committees chose a relevant scientists in the field of plasma processes, magnetron ion processing & arc technologies... they found interesting to invite to present their work in plenary session or invited talks.
Invitations are ongoing so the provisional list will be enriched gradually.
 Plenary speakers
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From one to three dimensional nanostructures by vacuum and plasma assisted methods
Dr. Ana Isabel Borrás Martos
Instituto de Ciencia de Materiales de Sevilla CSIC, ES
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Atmospheric pressure PECVD for solar energy conversion
Prof. Françoise Massines
PROMES, Univ. Perpignan, FR
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Fundamental Properties of TM Nitrides: Materials Design Strategies for Extreme Properties
Prof. Dr. Joseph E. Greene
Illinois Univ., Urbana, USA / Linköping Univ, SE /
National Taiwan Univ., Taipei, TW
W ebpage
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Understanding the effect of plasma surface charging on the catalytic surface activation of CO2 from quantum chemical modeling
Prof. Dr. Erik C. Neyts
PLASMANT, Univ. Antwerp, BE
Webpage
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Self-organisation phenomenon in magnetron sputtering plasmas
Dr. Ante Hecimovic
Ruhr-Univ. Bochum, DE
Webpage
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Invited speakers
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Thin film growth dynamics probed by real-time diagnostics
Grégory Abadias
Institut P', Univ. Poitiers, FR
Webpage
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Physical and chemical effects of self pulsing discharge generated in liquids
Franta Krcma
Brno Univ. of Technology, CZ
Webpage
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Gasless sputtering - a source of dense metal plasma
Joakim Andersson
Uppsala Univ., SE
Webpage
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Influence of argon dielectric barrier discharges on degradable ethyl lactate plasma polymers
Gaétan Laroche
LIS, Laval Univ., Québec, CA
Webpage
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Pulsed Laser Deposition : a flexible tool for the synthesis of advanced functional materials
Mohamed Chaker
INRS, Varennes, Québec, CA
Webpage
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Interaction of Cold Atmospheric Pressure Plasma with Polymers and Biomolecules
Gottlieb S. Oehrlein
IREAP, Univ. of Maryland, College Park, USA
Webpage
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The role of vibrational kinetics in pulsed discharge
Gianpiero Colonna
Institute of Inorganic Methodologies and Plasmas, CNR, Bari, IT
Webpage
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Experimental and numerical investigations of glow discharge plasmas for sputter deposition in superconducting RF cavities
Thibaut Richard
Swiss Plasma Center, EPFL, Lausanne, CH
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From hard coatings to optimized cutting tools
Abdou Djouadi
Institut des Materiaux Jean Rouxel, Nantes, FR
Webpage
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Understanding some aspects of RF driven negative hydrogen ion sources for fusion by means of diagnostics
Loic Schiesko
Max-Planck-Institut für Plasmaphysik, Garching, DE
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Composition of the gas phase and sputtering mode controls the local chemistry and structure of reactively sputter-deposited ZnO based thin films
David Horwat
Institut Jean Lamour, Lorraine Univ., FR
Webpage
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Electric field measurements in atmospheric pressure plasmas
Ana Sobota
Dep. of Applied Physics, Eindhoven Univ. of Technology, NL
Webpage
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Semiconducting Oxide and Sulphide Thin Films Deposited by Reactive High Power Impulse Magnetron Sputtering
Zdenek Hubička
Division of Optics, Institute of Physics, Prague, CZ
Webpage
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Plasma Conversion to Electrify Chemical Industry
Gerard van Rooij
Dep. of Applied Physics, Eindhoven Univ. of Technology, NL
Webpage
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Technology specifications for large area industrial PVD coatings
Andriy Kharchenko
Saint Gobain Recherche, Aubervilliers, FR
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