CIP is a biennial international conference focusing on the latest developments in plasma processing science and technology. The 20th International Colloquium on Plasma Processes (CIP) had take place in St Etienne, France from June 1st to 5th, 2015.
The first edition of MIATEC open to all European countries was held in 2010 under the organization of the French Vacuum Society (SFV). From then on it has been an biennial event jointly held with other conferences in the field of thin film processing. The 2015 edition was joined with Reactive Sputter Deposition symposium in Paris, from 8 to 15 December 2015.